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| High Energy Ion Implanter |
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High Energy is characterized by high
energy
(max. 1MeV~1.7 MEV) |
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Bernas and ELS Source.
Needle Valve and MFC High Pressure,
and SDS Gas Contorl System.
3-Axis SEN Electrode.
90KeV injector.
Linac Acceleration; Resonator and Power
Supply.
FEM ; Final Energy Magnet.
Super Disk Wafer Handling.
Sun Workstation; SPC and SECS/GEM with
UNIX Program. |
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